Sign In | Join Free | My burrillandco.com
Home > Wafer Heater >

4 Inch Heated Chuck High Precision Wafer Hot Chuck For Semiconductor Processing

XihaoT (Suzhou) Technology Co., Ltd.
Trust Seal
Verified Supplier
Credit Check
Supplier Assessment
Contact Now
    Buy cheap 4 Inch Heated Chuck High Precision Wafer Hot Chuck For Semiconductor Processing from wholesalers
     
    Buy cheap 4 Inch Heated Chuck High Precision Wafer Hot Chuck For Semiconductor Processing from wholesalers
    • Buy cheap 4 Inch Heated Chuck High Precision Wafer Hot Chuck For Semiconductor Processing from wholesalers
    • Buy cheap 4 Inch Heated Chuck High Precision Wafer Hot Chuck For Semiconductor Processing from wholesalers
    • Buy cheap 4 Inch Heated Chuck High Precision Wafer Hot Chuck For Semiconductor Processing from wholesalers

    4 Inch Heated Chuck High Precision Wafer Hot Chuck For Semiconductor Processing

    Ask Lasest Price
    Brand Name : GoGo
    Model Number : /
    Certification : ISO 9001:2015 / ISO 14001:2015 / ISO 45001:2018
    Payment Terms : T/T
    Price : CNY 30000~600000/set
    Delivery Time : 30~60 work days
    Supply Ability : 1set/day
    • Product Details
    • Company Profile

    4 Inch Heated Chuck High Precision Wafer Hot Chuck For Semiconductor Processing

    High-Precision Wafer Heater with -190°C to 150°C Temperature Range, ±0.1°C Stability, and Vacuum-Optimized Design for Semiconductor Processing
    Product Name: GoGo High-Precision Cryo/Heating Wafer Heater for Advanced Semiconductor Process Development (-190°C to 150°C)
    Product Introduction

    The GoGo High-Precision Wafer Heater is a state-of-the-art thermal processing platform engineered for the most demanding steps in semiconductor research and fabrication. Designed to support variable process detection and processing technologies—from deep cryogenic bonding to ALD thin film deposition and SiC epitaxial growth—this versatile Wafer Heater offers an exceptionally broad temperature range from -190°C to 150°C. With its high-stability silver sample stage and vacuum-compatible design, it delivers the precise, clean, and uniform thermal environment required for next-generation device development, making it an essential tool for both R&D and pilot-scale production.

    Key Advantages & Why Choose Our Wafer Heater
    • Unmatched Thermal Range for Cutting-Edge Processes: This Wafer Heater enables processes spanning extreme cryogenic to moderate-high temperatures. It is uniquely suited for novel applications like low-temperature bonding for 3D integration and provides precise thermal control for sensitive deposition processes such as Atomic Layer Deposition (ALD).

    • Superior Temperature Uniformity & Stability: Achieves exceptional thermal stability of ±0.1°C across the entire 4-inch silver platen. This ensures consistent process results, critical for uniform film deposition, reproducible bonding interfaces, and high device yield, whether in research or pre-production.

    • Rapid, Controllable Thermal Cycling: Engineered for efficiency, this Wafer Heater provides fast heating (up to 150°C/min) and controlled active cooling (via liquid nitrogen and water cooling), enabling rapid transition between process steps and reducing overall cycle times in development workflows.

    • Vacuum-Optimized for Process Purity: The system operates in a controlled vacuum environment, eliminating contamination and unwanted chemical reactions. This is paramount for high-purity epitaxial growth, clean surface processing, and achieving reliable, oxide-free interfaces in bonding applications.

    • Intelligent Control & Certified Reliability: Fully integrated with the powerful TNEX software for automated recipe control and data logging. Manufactured under ISO 9001, 14001, and 45001 certified processes, this Wafer Heater is built for reliability, safety, and repeatable performance in critical semiconductor environments.

    Technical Specifications
    ParameterSpecification
    Product TypeWafer Heater / Thermal Processing Chuck
    Temperature Range-190°C to 150°C
    Temperature Stability±0.1°C
    Wafer Size4 Inch (Customizable sizes available)
    Platen MaterialSilver (High thermal conductivity)
    Process EnvironmentVacuum
    Cooling SystemIntegrated Water Cooling
    Control SystemTNEX Software Platform
    Target Markets & Clients

    This advanced Wafer Heater is designed to accelerate innovation in the semiconductor sectors of key global regions, including Southeast Asia, the Middle East, Russia, and Africa. It is an indispensable asset for university nano-fabrication facilities, corporate semiconductor R&D labs, and compound semiconductor foundries focusing on MEMS, advanced packaging, and wide-bandgap materials like SiC and GaN.

    Frequently Asked Questions (FAQ)
    1. What processes is this Wafer Heater specifically designed for?
      It is optimized for a wide array of processes including low-temperature (cryogenic) wafer bonding, Atomic Layer Deposition (ALD), Silicon Carbide (SiC) epitaxy, annealing, and any application requiring precise temperature control in a vacuum.

    2. Can this system be integrated into our existing cluster tool or process chamber?
      Yes. The Wafer Heater is designed as a modular subsystem. We provide detailed interface specifications and can supply custom adapter plates to facilitate seamless integration into OEM vacuum chambers or cluster tool platforms.

    3. How is the cryogenic cooling achieved, and how stable is it?
      Cryogenic cooling is delivered via a closed-loop liquid nitrogen system managed by a precise cooling controller, enabling stable temperatures down to -190°C with minimal fluctuation, which is essential for bonding and material studies at extreme lows.

    4. What does the TNEX software control?
      The TNEX software provides complete command, allowing you to create, store, and run complex multi-step temperature recipes, monitor system status in real-time, and log all process data for full traceability and analysis.

    5. What maintenance does the Wafer Heater require?
      The system is designed for robust operation with minimal maintenance. The primary consumable is liquid nitrogen for cooling. The modular design allows for easy serviceability of key components if ever required.

    Quality 4 Inch Heated Chuck High Precision Wafer Hot Chuck For Semiconductor Processing for sale
    Inquiry Cart 0
    Send your message to this supplier
     
    *From:
    *To: XihaoT (Suzhou) Technology Co., Ltd.
    *Subject:
    *Message:
    Characters Remaining: (0/3000)